Our paper entitled “Effect of Ni Doping on the Electro-optic Property in K(Ta0.6Nb0.4)O3 Films” has been published in Jpn. J. Appl. Phys. We found that a larger withstand electric field was achieved by Ni doping, therefore, the variation of refractive index by the applicable maximum electric field was increased.
Citation: JJAP 61, SN1005 (2022).
