Published: Ni Doping Effect on the Electro-optic Property in K(Ta, Nb)O3 Films

Our paper entitled “Effect of Ni Doping on the Electro-optic Property in K(Ta0.6Nb0.4)O3 Films” has been published in Jpn. J. Appl. Phys. We found that a larger withstand electric field was achieved by Ni doping, therefore, the variation of refractive index by the applicable maximum electric field was increased.

Citation: JJAP 61, SN1005 (2022).

2024 Energy Func. Mater. Eng. Lab., Nagoya Univ. [Internal link]