Published: Crystallographic orientation dependences of sputtering yields

Our paper entitled “Crystallographic Orientation Dependence of the Sputtering Yields of Nickel and Copper for 4-keV Argon Ions Determined using Polycrystalline Targets” has been published in Nucl. Instr. Meth. Phys. Res. B. A novel experimental approach for revealing the crystallographic orientation dependences of sputtering yields was developed. The dependences determined experimentally were in semi-quantitative agreement with the dependences calculated using the extended Onderdelinden model, demonstrating that the non-channeling probability dominantly controls the sputtering yield.

Citation: Nucl. Instr. Meth. Phys. Res. B 418, 34-40 (2018).